Tantalum metal powder

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Product introduction of Tantalum metal powder Molecular formula: Ta Atomic number: 73 Density: 16.68g/cm ³ Boiling point: 5425 ℃ Melting point: 2980 ℃ Vickers hardness in annealed state: 140HV environment. Purity: 99.9% sphericity: ≥ 0.98 Hall flow rate: 13 ″ 29 loose density: 9.08g/cm3 tap density: 13.42g/cm3 particle size distribution: 15-45 μ m, 15-53 μ m, 45-105 μ m, 53-150 μ m,40nm,70nm,100nm,200nm or according to client's demand Product index of Tantalum metal powder

ITEM	SPECIFICATIONS	TEST RESULTS
Appearance	Dark Gray Powder	Dark Gray Powder
Assay	99.9%Min	99.9%
Particle Size		40nm,70nm,100nm,200nm
Impurities(%,Max)
Nb	0.005	0.002
C	0.008	0.005
H	0.005	0.005
Fe	0.005	0.002
Ni	0.003	0.001
Cr	0.003	0.0015
Si	0.005	0.002
W	0.003	0.003
Mo	0.002	0.001
Ti	0.001	0.001
Mn	0.001	0.001
P	0.003	0.002
Sn	0.001	0.001
Ca	0.001	0.001
Al	0.001	0.001
Mg	0.001	0.001
Cu	0.001	0.001
N	0.015	0.005
O	0.2	0.13

Application of Tantalum metal powder The dense oxide film produced on the surface of tantalum powder has the properties of single-phase conductive valve metal, high resistivity, high dielectric constant, earthquake resistance, and long service life. It has important applications in high-tech fields such as electronics, metallurgy, steel, chemical engineering, hard alloys, atomic energy, superconducting technology, automotive electronics, aerospace, medical and health, and scientific research. Advantages of Tantalum metal powder 1. High sphericity 2. Few satellite balls in the powder 3. Good flowability 4. Controllable particle size distribution of the powder 5. Almost no hollow powder 6. High loose density and tap density 7. Controllable chemical composition and low oxygen content Certificate： What we can provide：

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